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Dr. Mohammad Ali Mohammad
Assistant Professor
Materials Engineering Department

SCME
National University of Sciences and Technology (NUST)
H12, Islamabad.
Tel : 92-51-9085-5214

Specialization
Nanofabrication (CMOS Processing, Electron Beam Lithography), NEMS / MEMS (Cantilevers, Surface Acoustic Wave SAW Devices), Nanoelectronics (Resistive Memory Devices), Molecular Dynamics Simulations (Polymer Properties, Solutions)

Education
Ph.D. in Microsystems & Nanodevices, University of Alberta, Canada

Education

•    (Sept. 2008 – Aug. 2013) Doctor of Philosophy (PhD) in Microsystems & Nanodevices
      Department of Electrical and Computer Engineering, University of Alberta, CANADA
•    (Sept. 2004 – Apr. 2008) Bachelor of Science (BSc) in Electrical Engineering
      Department of Electrical Engineering, University of Alberta, CANADA
•    (May. 1992 – Apr. 2004) SSC and HSSC (Part I & II) from FBISE
      Islamabad College for Boys, G-6/3, Islamabad, PAKISTAN

Experience
(Please see adjoining Research tab and Publications tab)

•    (Oct. 2013 – Apr. 2016) Postdoctoral Fellow, Institute of Microelectronics, Tsinghua University, Beijing, CHINA
•    (Oct. 2010 – May 2012 / Part Time) Electron Beam Lithography Process Developer, University of Alberta Nanofabrication Facility (nanoFAB), Edmonton, CANADA
•    (Sept. 2008 – Aug. 2013) Graduate Student Researcher, University of Alberta, CANADA and the National Institute for Nanotechnology (NINT), CANADA
•    (May 2008 – Aug. 2008) NSERC Summer Research Student, University of Alberta, CANADA
•    (May 2007 – Aug. 2007) NSERC Summer Research Student, University of Alberta, CANADA
•    (May 2006 – Aug. 2006) NSERC Summer Research Student, University of Alberta, CANADA

Honors & Highlights

•    Won independent CHINESE research funding during postdoctoral work
•    Won CANADIAN research funding during graduate studies
•    Won CANADIAN international, national, provincial, institutional, and departmental awards and scholarships (15 in total from 2006-2016)
•    Collaborated with research groups in Canada, China, Greece, Saudi Arabia, UK, and USA during my foreign research work from 2006-2016
•    Presented in Canada, China, Germany, Italy, Japan, Pakistan, and USA
•    User of over 20 types of micro and nanofabrication tools (total tool count exceeding 35)
•    Reviewer for five international journals (all SCI)
•    President of departmental graduate students association (ECEGSA) during Ph.D.
•    Trained over a dozen users, solved equipment issues, and wrote manuals while as a staff member at the University of Alberta Micro and Nanofabrication Facility (nanoFAB)
•    Trained eight colleagues from my Ph.D. research group on electron beam lithography (EBL) and nanofabrication techniques on multi-million USD valued equipment
​•    (2014-2016) Ion beam based reduction of graphene oxide (GO) for electronic devices
•    (2013-2016) High frequency surface acoustic wave (SAW) device fabrication
•    (2013-2016) Nanoscale resistive memory (RRAM) device fabrication & testing
•    (2010-2011) Fabrication of silicon nanopillars for image sensors
•    (2010-2013) Molecular Dynamics (MD) simulations of PMMA properties and solutions
•    (2009-2011) SiCN nanostring fabrication & characterization (NEMS cantilevers)
•    (2006-2007) Mass spectrometry of PMMA short chains
•    (2006-2016) High resolution electron beam lithography (EBL) studies on various resists
o    This includes multiple independent and dependent projects
o    Resist materials include PMMA, ZEP, HSQ, SML, & CSAR-62

Note:
(a)    The research topics listed above do not correspond to project titles or funding titles. They are simply a brief description intended for the reader’s consumption.
(b)    Besides the above projects, which were mostly led by myself, there are numerous other projects in which I have participated in various kinds of roles.

https://scholar.google.ca/citations?user=oUS1LM4AAAAJ

​Publications Summary (as of July 2016)
Book Chapters = 03
Journal Articles = 30
Conference Proceedings = 08
(Cumulative Impact Factor =  133.2, Citations = 514, H-Index = 13)
Non-Refereed = 01 case study; 08 technical manuals

Presentations Summary (as of July 2017)
Invited Talks = 09
Visiting Lectures = 08
Conference Presentations = 13 (not including above)
Conference Posters = 10

Publications (Selected 10 out of 36)
Publication Reference
X. Chen,* M. A. Mohammad,* J. Conway, B. Liu, Y. Yang, and T.-L. Ren, “High performance lithium niobate surface acoustic wave transducers in the 4-12 GHz super high frequency range” Journal of Vacuum Science and Technology B, vol. 33, 06F401 (2015). DOI: 10.1116/1.4935561 (*)These authors contributed equally. (IF = 1.464)

X. Wang, H. Tian, M. A. Mohammad, C. Li, C. Wu, Y. Yang, and T.-L. Ren, “A spectrally tunable all-graphene-based flexible field-effect light-emitting device” Nature Communications vol. 6, 7767 (2015). DOI: 10.1038/ncomms8767 (IF = 11.470)

H. Tian, C. Li, M. A. Mohammad, Y.-L. Cui, W.-T. Mi, Y. Yang, D. Xie, and T.-L. Ren, “Graphene Earphones: Entertainment for both Humans and Animals” ACS Nano, vol. 8, 5883 (2014). DOI: 10.1021/nn5009353 (IF = 12.033)

M. A. Mohammad, S. K. Dew, and M. Stepanova, “SML resist processing for high-aspect-ratio and high-sensitivity electron beam lithography” Nanoscale Research Letters, vol. 8, 139 (2013). DOI: 10.1186/1556-276X-8-139 (IF = 2.524)

M. A. Mohammad, K. P. Santo, S. K. Dew, and M. Stepanova, “Study of the interaction of polymethylmethacrylate fragments with methyl isobutyl ketone and isopropyl alcohol” Journal of Vacuum Science and Technology B, vol. 30, 06FF11 (2012). DOI: 10.1116/1.4766318 (IF = 1.267)

M. A. Mohammad, M. Muhammad, S. K. Dew, and M. Stepanova, “Fundamentals of Electron Beam Exposure and Development” chapter 2 in Nanofabrication, M. Stepanova and S. Dew, Eds., Springer: New York, Dec. 2011, pp. 11-41, ISBN: 978-370-910-423-1. DOI: 10.1007/978-3-7091-0424-8_2

M. A. Mohammad, S. K. Dew, S. Evoy, and M. Stepanova, “Fabrication of sub-10 nm silicon carbon nitride resonators using a hydrogen silsesquioxane mask patterned by electron beam lithography” Microelectronic Engineering, vol. 88, pp. 2338-2341 (2011). DOI: 10.1016/j.mee.2010.11.045 (IF = 1.557)

M. A. Mohammad, C. Guthy, S. Evoy, S. K. Dew, and M. Stepanova, “Nanomachining and clamping point optimization of silicon carbon nitride resonators using low voltage electron beam lithography and cold development” Journal of Vacuum Science and Technology B, vol. 28, pp. C6P36-C6P41 (2010). DOI: 10.1116/1.3517683 (IF = 1.271)

M. A. Mohammad, T. Fito, J. Chen, S. Buswell, M. Aktary, M. Stepanova, and S. K. Dew, “Systematic study of the interdependence of exposure and development conditions and kinetic modelling for optimizing low-energy electron beam nanolithography” Microelectronic Engineering, vol. 87, pp. 1104-1107 (2010). DOI: 10.1016/j.mee.2009.11.047 (IF = 1.575)

M. A. Mohammad, S. K. Dew, K. Westra, P. Li, M. Aktary, Y. Lauw, A. Kovalenko, and M. Stepanova, “Nanoscale resist morphologies of dense gratings using electron-beam lithography” Journal of Vacuum Science and Technology B, vol. 25, pp. 745-753  (2007). DOI: 10.1116/1.2731330 (IF = 1.419)


Presentations (Selected 08 out of 37)
Publication Reference

M. A. Mohammad, X. Chen, B. Liu, Y. Yang, and T.-L. Ren, “Super high frequency lithium niobate surface acoustic wave transducers up to 14 GHz” contributed talk to the 61st IEEE International Electron Devices Meeting IEDM, (Washington, DC, USA), Dec. 7-9, 2015.

M. A. Mohammad, H. Tian, Q.-T. Xue, X. Chen, Y. Yang, and T.-L. Ren, “Hafnium oxide resistive memory based on cross-bar structures down to sub-20 nm dimensions” contributed talk to the 59th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication EIPBN, (San Diego, CA, USA), May 26-29, 2015.

M. A. Mohammad, “Nanoscale device fabrication using RAITH electron beam lithography systems” Invited talk on behalf of RAITH GmbH at the Institute of Physics IoP Summer School, Chinese Academy of Sciences CAS, (Beijing, China), Jul. 14-18, 2014.

M. A. Mohammad, K. P. Santo, S. K. Dew, and M. Stepanova, “Study of the interaction of polymethylmethacrylate fragments with methyl isobutyl ketone and isopropyl alcohol” poster presentation at the 56th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication EIPBN, (Kona, HI, USA), May 29 - June 1, 2012.

M. A. Mohammad, “Nanoscale electron beam resist processing and applications” Visiting lecture at E-Beam Town Hall Meeting, Stanford Nanofabrication Facility SNF, Stanford University, (Palo Alto, CA, USA), Oct. 28, 2011.

M. A. Mohammad, K. Koshelev, T. Fito, D. A. Z. Zheng, M. Stepanova, and S. K. Dew, “Alternative developers for ZEP-520 as a high-resolution positive and negative tone electron beam resist” poster presentation at the 24th International Microprocesses and Nanotechnology Conference MNC, (Kyoto, Japan),
October 24-27, 2011.

M. A. Mohammad, “Towards sub-10 nm patterning with electron beam lithography: processes & applications” Invited talk at the 17th Seminar on Electron and Ion Beam Lithography for Applications in Nanotechnology NANO2011, RAITH GmbH Headquarters, (Dortmund, Germany), Feb. 21-22, 2011.

M. A. Mohammad, S. Evoy, S. K. Dew, and M. Stepanova, “Fabrication of sub-10 nm SiCN resonators using a hydrogen silsesquioxane mask patterned by electron beam lithography” contributed talk to the 36th International Conference on Micro & Nano Engineering MNE, (Genoa, GE, Italy), Sept. 19-22, 2010.


MSE 471   Vacuum Technology in Surface Engineering         Spring 2017
NSE 845   Nanolithography and Device Fabrication             Spring 2017
EE 103      Electrical Engineering                                         Fall 2016   
NSE 846    Introduction to NEMS/MEMS                              Fall 2016

 
Foreign (Department of Electrical & Computer Engineering, University of Alberta, CANADA)

•  (Jan. 2010 – Apr. 2010) Lab Instructor, EE 457: Microfabrication & Devices (class size: 15)
•  (Sept. 2009 – Dec. 2009) Teaching Assistant, EE 457: Microfabrication & Devices (class size: 32)
•  (Jan. 2009 – Apr. 2009) Marker, EE 456: Introduction to Nanoelectronics (class size: 78)